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Dielectric Barrier Discharge (DBD) plasma reactors are a type of reactor that has recently been used by industry to produce graphene commercially.
In contrast to other methods, DBD plasma reactors lead to a standalone graphene product.
The other methods employ plasma-assisted methods that are more applicable to academic interests or are restricted to deposition onto a specific surface.
These are substrates on which graphene can be grown directly upon and include materials such as boron nitride, silicon, silicon dioxide, aluminum oxide, gallium nitride, magnesium oxide and silicon nitride, to name a few.
While this has been a focus of much research, the results thus far have been mixed, proving difficult to get both continuous and highly conductive films.